Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

Vacuum Coating and sputtering targets

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Vacuum coating

Vacuum coating science and technology is the most active one in the application of technology, which involves coating equipment, process, membrane, sputtering target and other aspects, many different types of films, where only one part of a simple exposition.

Hard film

Nature hardest diamond, cubic boron nitride second, third boron carbide.

① diamond films (CVD Production): hot filament CVD diamond film deposition rate method 2.5μm / h, HV40 ~ 50GPa;
② B4C Boron Carbide: Production by magnetron sputtering, high temperature thermal stability, 1100 ℃ or more, it is the most hard materials, HV50.4gPa;
③ composite film: TiN-Gen 1; TiCN, TiAlN – the second generation; third generation is a multi-component composite film and multilayer systems; TiN / TiCN, TiN / NbN, TiN / TiAlN, TiN / CrN, TaN / NbN (tantalum nitride / niobium nitride), HV55.6GPa, developed into a multi-layer nano-graded film – TiAl, TiAl1, TiAl2, ZrN (zirconium nitride). Direction of development: improving film toughness, wear resistance, heat resistance, corrosion resistance.

 Diamond coated tools

Research Interests: ① to improve diamond adhesion between the coating and the substrate, intermediate layer design, develop multi-coated tools; ② increase the deposition area and increase growth rate; ③ PVD method of diamond coating theory and technology.

Light, electricity, magnetic features film

The film features a wide range of different properties, to name just some examples.

① Thin Film: Y2O3: Eu (urea solution method D) Eu (RF sputtering);

② cold light film – highly reflective visible light, infrared light areas of high transmission, to achieve cold exposure, to protect the purpose of the illuminated objects;

③ organic optoelectronic films: metal phthalocyanine films: CuPc-PbPc; CuPc / ZnS; TiOPc highly sensitive coefficient;

④ optoelectronic functional composite film – Ag-Au-SiO2, Ag-BaO, Ag-SiO2, Ag-MgF2, in which nano-Ag-MgF2 cermet films have optical absorption properties, Ag-BaO with photoelectric emission;

⑤ transparent conductive film: ITO (In2O3: Sn), ZAO (ZnO: Al), IMO (In2O3: Mo);

⑥ photochromic film: 18 films alkyl substituted spiropyran (SP-18), change color under ultraviolet irradiation, colorless in the visible light of recovery can be used for optical information storage, optical switches, etc.;

⑦ magneto-optical recording films: PbFeCo (Pb, Fe, Co);

⑧ very large scale integration (VLSI): the Si substrate by sputtering Cu or Al, to achieve multi-layer wiring;

⑨ semiconductor films: SiC, ZnO;

⑩ other optical and electromagnetic properties of feature film:

LiF, CaF2 used in flat-type field emission display;
Fe / Cr multilayers with giant magnetoresistance (GMR);
Fe = SiO2 film with tunneling magnetoresistance (TMR);
TiO2 film has excellent dielectric, piezoelectric, gas and photocatalytic function;
Cu-SCN-Al (organic network and physical) are polar memory effect;
Triethylamine – four cyanide-P-quinone II methane (TEA (TCNQ) 2) is a single crystal can be used for high-density information storage of organic composite materials;
YBCO is a high-temperature superconducting (HTS) film.

Decorative film

Research Interests: ① positive for thin film materials composite, multi-type, high-performance, new technology direction ② the design of composite film, performance testing, methods of preparation; ③ of film stress (firmness); ④ of large area target production technology to improve target utilization.

Cutting-edge issues

① found to have the new features of the new coating material;

② remarkable features of the new design of the membrane system (membrane);

③ high-tech industries, such as integrated circuit industry, the information storage industry, flat panel display industry, including liquid crystal display (LCD), plasma display panel (PDP), field emission display (EL);

④ depth the relationship between the structure and properties of the film theory.

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Titanium aluminum production technology

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Titanium aluminum alloy production technology:

Aluminum titanium gold extraction, is a coating technology, which is based on the conventional titanium technology to increase pre-plating and electroplating process steps, pre-plating process is the activation of the plating solution placed in the hydrochloric acid salt and chemical treatment ; plating bath composition including nickel sulfate, nickel chloride, boric acid, sodium lauryl sulfate, saccharin, brightener, the process is simple, practical, good effect, etc., prepared by the process of titanium aluminum The film hardness HV ≈ 1500, under the same conditions than the 22K gold plated wear 150 times, can be processed into various forms of gold, color, black and bright variety of series of aluminum products.
Aluminum titanium gold extraction, including the selection, polishing, chemical degreasing, water rinse, activation, titanium vacuum process steps, characterized in that it includes:

a : pre-plating process, the process is activated by water washing, and placed in the titanium aluminum salt, hydrochloric acid and water composition of the liquid chemical treatment, temperature is normal temperature, the processing time to the violent chemical reaction of liquid date;

b: electroplating process, the process in the bath composition including nickel sulfate, nickel chloride, boric acid, sodium lauryl sulfate, saccharin, brightener, process conditions: current 3-4A / dm2 cathode Mobile ,5-7A / dm2 agitation, bath temperature 50-60 ℃, PH value 3.9-4.2, plating time 15 minutes.

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Welding methods between sputtering target and backing plate

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Welding methods between sputtering target and backing plate

Preparing tantalum target and backing plate,to add filler metal on the welding surface of backing plate;brazing in a vacuum environment, heating and the melting solder will be welded to backing plate and formating the target components; and make a insulation thermal diffusion treatment; cooling target components, and make mechanical processing to remove excess solder.
 
The invention is in the vacuum environment of the device,making a large area of welding, the welding metal surface can be effectively prevent oxidation,it is conducive to the infiltration of solder and metals, making the tantalum target and the binding strength between the back plate, resulting in sputtering process tantalum target to avoid the disengagement from the backing plate and get a normal sputtering.
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A method of producing ITO target with homogeneous nano-ITO powder

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A method of producing ITO target with homogeneous nano-ITO powder

ITO target preparation method, take 4 ~ 5N purity of the metal indium or tin, according to In2O3: SnO2 = 9:1 proportion of the ingredients add the ingredients in the melting device, ohmic heating 250 500 ℃ for melting. Then pressed into the reactor and add 50 ~ 1000V Voltage ,50-1000A current, which leads to nitrogen-oxygen mixed gas or pure oxygen, rapid cooling by cold air or liquid nitrogen to form a complete solution to the tin oxide indium oxide lattice of the single-phase nano-ITO powder. 20MPa pressure in the dry pressed billet and the pressure at 200 ~ 300MPa cold isostatic pressing under the green body made of ITO, ITO green body and then into the high-temperature oxygen atmosphere sintering furnace, and pass into the pure oxygen, under pressure 0.1 ~ 1.0MPa The atmospheric pressure and 1450 ~ 1650 ℃ high temperature sintering 6 ~ 40h are fired into the ITO target. High purity, high crystallinity, dispersion, and liquidity.

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Vacuum coating machine with formed coating sputtering target

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 Vacuum coating machine with formed coating sputtering target

The target used a vacuum crucible coating machine which matched to the shape of the molding block structure, the structure shape: columnar, round table-like, cone-shaped, circular, semi-circular, fan ring, coils, by the ultra powdery coating material by high-pressure molding made of vacuum sintering. The target has a high density, fine and uniform grain characteristics, the use of the overall shape block, so use a long time to adapt to long multi-coated optical films, and in vacuum coating, the thickness uniformity consistent, reproducible, and easy mass production to achieve stability. The target coating is easy to change in use, and it can improve the coating efficiency, increase yield, reduce production costs, especially for high-quality, high-precision optical products of the coating.

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Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®