Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

LCD sputtering targets

Able Target Provide sputtering targets in LCD applications.

In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. Able Target provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.

 

Ni,NiCr,Al,AlTi,TiB,Ta,NiMn,FeNi,PtMn,Al2O3,AlTi,CoCrPt,CoCrPtB,Si,C,GeAsTe,,Bi,AgInAsTe,MoSix,Cr,TaB,TaGe,Si,SiO2
Ti (TiO2),Al (Al2O3),SUS,Ta,Ag,ZnO,ITO,ZnO-Al2O3,

metal sputtering target

Able Target Limited specializes in producing high purity metal sputtering target with the highest possible densityand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, Carbon, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), lanthanum (La), Lead (Pb), Lutetium (Lu), Manganee (Mn), Molybdenum (Mo), Magnesium (Mg),Neodymium (Nd), Niobiums (Nb), Nickel (Ni), Palladium (Pd),Platinum (Pt), Praseodymium (Pr),Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc),Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn)

 Our materials(metal sputtering target) can be fabricated to fit all commercial or custom designed systems.


Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®