Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

metal sputtering target

Share this and Help Others:
Twitter Linkedin Digg Delicious Reddit Stumbleupon Tumblr Posterous Email Snailmail

Able Target Limited specializes in producing high purity metal sputtering target with the highest possible densityand smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy), Erbium (Er), Europium (Eu), Gadolinium (Gd), Germanium (Ge), Gold (Au), Graphite, Carbon, (C), Hafnium (Hf), Holmium (Ho), Iridium (Ir), Indium (In), Iron (Fe), lanthanum (La), Lead (Pb), Lutetium (Lu), Manganee (Mn), Molybdenum (Mo), Magnesium (Mg),Neodymium (Nd), Niobiums (Nb), Nickel (Ni), Palladium (Pd),Platinum (Pt), Praseodymium (Pr),Rhenium (Re), Ruthenium (Ru), Samarium (Sm), Scandium (Sc),Selenium (Se), Silicon (Si), Silver (Ag), Tantalum (Ta), Terbium (Tb), Tellurium (Te),Tin (Sn), Thulium (Tm), Titanium (Ti), Tungsten (W), Vanadium (V), Ytterbium (Yb), Yttrium (Y), Zirconium (Zr), Zinc (Zn)

 Our materials(metal sputtering target) can be fabricated to fit all commercial or custom designed systems.

Share this and Help Others:
Twitter Linkedin Digg Delicious Reddit Stumbleupon Tumblr Posterous Email Snailmail


Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®