Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

LCD sputtering targets

Able Target Provide sputtering targets in LCD applications.

In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. Able Target provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.


Ti (TiO2),Al (Al2O3),SUS,Ta,Ag,ZnO,ITO,ZnO-Al2O3,

Thin-Film Materials

Able Target is a full-service Thin-Film Materials provider. We offer high quality products designed for the vacuum industry. These products include metals, alloys and ceramics in any customer designed configuration. Our company provides product design,ICP and full traceability/analysis of materials. Our materials can be fabricated to fit all commercial or custom designed systems.

Sputtering Targets list (By Application) :

Semiconductor Correlative targets / Thin film of electrode and wire layout : aluminium target, copper target,gold target,silver?target, palladium target, platinum target,alumium silicom target,aluminium silicom copper alloy target and so on.

Thin film of packet eletrode: Molybdenum targets,tungsten targets,titanium targets and so on;

Thin film of conglutinate: Tungsten target, titanium targets and so on.
Thin insulating film:PbTiZrO3 targets and so on.

Hard disk with a magnetic thin film magnetic recording: CoCrTa alloy targets, CoCrPt alloy targets,CoCrTaPt alloy target…

Magnetic head of thin film: CoTaCr alloy targets,CoCrZr alloy target …

Tificial crystal film: CoPt alloy target,CoPd alloy targets …

Phase change optical disk recording films: TeSe target,SbSe target,GeSbTe targets,GeTe alloy targets …

Magneto-optical recording films for disk: TbDyCo allohy targets,TbDyFe targets,Al2Oe targets,MgO targets,SiN targets…

CD reflective film: Aluminium targets,AlTi alloy targets, AlCr targets,Gold targets,Gold alloy targets…

CD Protection Film: SiN targets,SiO2 targets,ZnS targets …

Transparent conductive film for flat display: ITO target,AZO targets,silicon dioxide target,titanium target,chromium targets…

Display wiring film electrode: Molybdenum targets, tungsten target,Titanium target, tantalum targets, Chromium target,aluminium targets,aluminum titanium alloy targets,AlTa alloy targets,Aluminium neodymium alloy target,AlNd alloy targets…

Display Thin Film electroluminescent: ZnS doped Mn targets, ZnS doped Tb targets, ZnS doped Eu targets, Y2O3 targets, Ta2O5 targets, BaTiO3 targets…

Decorative Film: Titanium targets, Zirconium targets, Chromium targets, TiAl targets, SS targets …

Low resistance film: NiCr target, NiCrSi alloy targets, NiCrAl targets, NiCu alloy targets…

Superconducting thin films: YBCO targets (YBaCuO targets), BiSrCaCuO targets …

Tools plating film: Nitride targets, Carbide targets, Boride targets, Cr target, Ti targets, TiAl alloy targets,Zr target, Graphite targets, Aluminum 99.99%, Chromium 99.5%, Nickel/Chromium 99.5%, Nickel & Alloys 99.5%, Tungsten Carbide C:0.4%, Titanium & Alloys ( TiAL, TiALY) 99.5%, Zirconium 99.5%

Thin film solar cell:Silicon sputtering targets, Gallium Arsenide (GaAs)99.999%, ITO 99.99%,Titanium metal 99.9%,Aluminum Zinc Oxide (AZO) 99.99%,Zinc Oxide (ZnO) 99.99% Silicon Dioxide ( Si02 ) 99.99%, Titanium Oxide (TiO2 ) 99.99%, Molybdenum 99.9%, Nickel / Chromium ( 80:20 )99.5%, NiV targets, Chromium target 99.5~99.9%, Cadmium Telluride (CdTe) 99.999%,Cadmium Sulfide (CdS), 99.99%, 99.999%, Platinum (Pt) 99.99%, GaSe target, GaS target, CuGa target, CuIn target, CuInGaSe (CIGS) 99.99%, CuInSe(CIS) 99.99%, ZnAl alloy sputtering target, CIG sputtering target (5N)


ITO target

 ITO sputtering target

ITO(In2O3:SnO2)sputtering target


chemical composition:

97 wt% In2O3,3 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥6.88g/cm3

95 wt% In2O3,5 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥7.05 g/cm3

90 wt% In2O3,10 wt%SnO2 purity:99.99% relative density:>99%, actual density: ≥7.06g/cm3

or in accordance with customer’s request;

membrane resistance: RF magnetic control, substrate heating temperature 220℃,

Shape: plate,tube.

Size: in accordance with customer’s request

We provide high-purity sputtering targets and vapor deposition materials in shapes and sizes to suit every application.

A method of producing ITO target with homogeneous nano-ITO powder

A method of producing ITO target with homogeneous nano-ITO powder

ITO target preparation method, take 4 ~ 5N purity of the metal indium or tin, according to In2O3: SnO2 = 9:1 proportion of the ingredients add the ingredients in the melting device, ohmic heating 250 500 ℃ for melting. Then pressed into the reactor and add 50 ~ 1000V Voltage ,50-1000A current, which leads to nitrogen-oxygen mixed gas or pure oxygen, rapid cooling by cold air or liquid nitrogen to form a complete solution to the tin oxide indium oxide lattice of the single-phase nano-ITO powder. 20MPa pressure in the dry pressed billet and the pressure at 200 ~ 300MPa cold isostatic pressing under the green body made of ITO, ITO green body and then into the high-temperature oxygen atmosphere sintering furnace, and pass into the pure oxygen, under pressure 0.1 ~ 1.0MPa The atmospheric pressure and 1450 ~ 1650 ℃ high temperature sintering 6 ~ 40h are fired into the ITO target. High purity, high crystallinity, dispersion, and liquidity.

Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®