Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

Chinese sputtering targets manufacturer

AbleTarget Limited manufacture all kinds of sputtering targets,high purity and density targets,rotatable Targets,alloy targets,pure metal targets and other sputtering coating materials,thin film materials,PVD and CVD coatings and products,now becoming a perfect sputtering targets supplier around the world.

Especially,ceramic sputtering targets,Indium Tin Oxide,Nb2O5,Aluminum oxide,ZnO/Al2O3,SiC,IGZO,HfO2,La2O3,SrRuO3,LaSrMnO,ZnS,SnO2,Ta2O5,etc

Oxides Sputtering targets

Able Target Limited provide you Oxide Ceramic Sputtering targets:

Al2O3, Sb2O3, ATO ,BaTiO3, Bi2O3, CeO2, CuO, Cr2O3 ,Dy2O3 ,Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2, HfO2, Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3, Nd2O3, Pr6O11, Pr(TiO2)2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2, Tm2O3, TiO2, TiO, Ti3O5, Ti2O3, SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO:Al, ZrO2, ZrO2-5-15wt%CaO)
Able Target Limited can provide sputtering targets on Optical and Architectural applications,the ability of certain elements to selectively absorb and emit highly specific wave length ranges and also reduce glare due to their high refractive index when deposited on a glass substrate resulted in the development of sputtering and evaporation materials of elemental rare earths, such as neodymium and dysprosium and many other optically active and anti-reflective (AR) materials.

ITO target

 ITO sputtering target

ITO(In2O3:SnO2)sputtering target

99.9%~99.99%

chemical composition:

97 wt% In2O3,3 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥6.88g/cm3

95 wt% In2O3,5 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥7.05 g/cm3

90 wt% In2O3,10 wt%SnO2 purity:99.99% relative density:>99%, actual density: ≥7.06g/cm3

or in accordance with customer’s request;

membrane resistance: RF magnetic control, substrate heating temperature 220℃,

Shape: plate,tube.

Size: in accordance with customer’s request

We provide high-purity sputtering targets and vapor deposition materials in shapes and sizes to suit every application.

A method of producing ITO target with homogeneous nano-ITO powder

A method of producing ITO target with homogeneous nano-ITO powder

ITO target preparation method, take 4 ~ 5N purity of the metal indium or tin, according to In2O3: SnO2 = 9:1 proportion of the ingredients add the ingredients in the melting device, ohmic heating 250 500 ℃ for melting. Then pressed into the reactor and add 50 ~ 1000V Voltage ,50-1000A current, which leads to nitrogen-oxygen mixed gas or pure oxygen, rapid cooling by cold air or liquid nitrogen to form a complete solution to the tin oxide indium oxide lattice of the single-phase nano-ITO powder. 20MPa pressure in the dry pressed billet and the pressure at 200 ~ 300MPa cold isostatic pressing under the green body made of ITO, ITO green body and then into the high-temperature oxygen atmosphere sintering furnace, and pass into the pure oxygen, under pressure 0.1 ~ 1.0MPa The atmospheric pressure and 1450 ~ 1650 ℃ high temperature sintering 6 ~ 40h are fired into the ITO target. High purity, high crystallinity, dispersion, and liquidity.


Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®