Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

Sputtering Target

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 sputtering target of Able Target


Able Target Limited is the earliest manufacturer engaged in sputtering targets in china.
We supplies all kinds of  Sputtering targets such as

Metal sputtering targets : boron target, magnesium target, scandium target, titanium target, vanadium target, chromium target, manganese target, cobalt target, nickel target, gallium target, Ge target, selenium target, yttrium target, zirconium target, niobium target, molybdenum target, ruthenium target, rhodium target, palladium target, Silver target, cadmium target, indium target, tin target, antimony target, tellurium target, hafnium target, tantalum target,niobium target, tungsten target, rhenium target, iridium target, platinum target , gold target, lead target, bismuth target, cerium target, Pr target, wolfram carbide,terbium target, holmium target, erbium target, thulium target and so on.

Alloy Sputtering Targets: Al-Ag target, Al-Si target,Al-Si-Cu target,Ag-Pt target,Ag-Cu target,Ce-Gd target,Cu-Ce target,Ce-Sm target,Co-Zr target,Co-Cr target,Co-Ni target,Co-Pd target,Co-Fe target,Cr-V target,Cr-B target,Cr-Cu target,Co-Ni-Cr target,Dy-Fe target,Gd-Fe target,Gd-Fe-Co target,Ga-As target,In-Sn target,Ir-Rh target,Ir-Pt target,InSb target,La-Y target,La-Fe target,La-Ti,MZT (MoTiZr alloy),Ni-Fe target,Ni-Ti target,Ni-V target,Ni-Cr target,Nd-Dy-Fe-Co target,NdFeB target,Sm-Fe target,Tb-Fe target,TbDyFe target,Ti-Al target,TiNd target,TiCo target,Tb-Fe-Co target,Tb-Gd-Fe-Co target,Y-Al target,Y-Cr target,Zr-Ti target,Zr-Ni target,Zr-Nb target,Zr-Al target,Zr-Cu target,Zr-Y target,Zr-Hf target,Zr-Sm target..

Ceramic Sputtering Targets, crystal targets:Al2O3 (aluminum oxide), Al2O3/ZnO (AZO) aluminum zinc oxide,WO3,GeO2,BaF2,CaF2,CeO2,CeF3,Dy2O3,Eu2O3,Er2O3,Gd2O3,Ho2O3,HoBCO,In2O3/SnO2,ITO),In2O3/ZnO,



Evaporation material:Al pellet, Ag pellet, Chrome Plated Tungsten Rods, Cr pellet, Cu pellet, Hf pellet, Mo pellet, Ni Cr pellet, Ni pellet, W pellet, Ta pellet, W boat, Ir pellet, Zr pellet e.t.c (other shape: rods, shots, wire) Rare earth oxide: Lanthanum oxide(La2O3),Cerium oxide(CeO2),Praseodymium oxide(Pr6O11), Neodymium oxide(Nd2O3),Samarium oxide(Sm2O3),Europium oxide(Eu2O3),Gadolinium oxide(Gd2O3), Terbium oxide(Tb4O7), Dysprosium oxide(Dy2O3),Holmium oxide(Ho2O3),Erbium oxide(Er2O3), Thulium oxide(Tm2O3),Ytterbium oxide(Yb2O3),Lutetium oxide(Lu2O3),Scandium oxide(Sc2O3), Yttrium oxide(Y2O3).

Rare Earth metal:Lanthanum(La),Cerium(Ce),Praseodymium(Pr),Neodymium(Nd),Samarium(Sm), Europium(Eu),Gadolinium(Gd),Terbium(Tb),Dysprosium(Dy),Holmium(Ho),Erbium(Er),Thulium(Tm), Ytterbium(Yb),Lutetium(Lu),Scandium(Sc),Yttrium(Y).

Rare earth metal alloy sputtering targets:Scandium- Aluminum alloy (Sc-Al alloy), Terbium – Dysprosium Alloy (Tb-Dy alloy), Yttrium-Aluminum alloy (Y-Al alloy), Copper – Cerium alloy (Cu-Ce alloy), Neodymium – Aluminum alloy (Nd-Al alloy ), Dysprosium – Iron alloy (Dy-Fe alloy), Holmium – Copper alloy (Ho-Cu alloy),Terbium – Dysprosium -Iron alloy (Tb-Dy-Fe alloy) e.t.c, Rare Earth Nitride: Lanthanum nitride (LaN),Cerium nitride (CeN),Praseodymium nitride (PrN),Neodymium nitride (NdN),Samarium nitride (SmN),Europium nitride (EuN),Gadolinium nitride (GdN),Terbium nitrid, (TbN),Dysprosium nitride (DyN),Holmium nitride (HoN),Erbium nitride (ErN),Thulium nitride (TmN),Ytterbium nitride (YbN),Lutetium nitride (LuN),Yttrium nitride (YN),Scandium nitride (ScN).

Nanometer Powder:La2O3, CeO2, Pr6O11, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, SiC, Si3N4, AlN, Al2O3, Al(OH)3, TiN, TiO2,TiC,

Crucibles: Platinum crucibles, Pt alloy (with Au, Rh, etc) crucibles, W crucibles, Mo crucibles, Ag crucibles, Tantalum (Ta) crucibles, Niobium (Nb) crucibles, Iridium (Ir) crucibles

Maybe what you need is not in the lists.We can also manufacture  special size sputtering targets according to our customer’s requests.

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ABLE TARGET-excellent supplier of sputtering targets

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Almost all IC manufacturers will use sputtering targets,ABLE TARGET is one of the first commercial vendors which commercialized Integrated Circuit sputtering target,and fill gaps in the domestic sputtering target industry,breaking the monopoly of foreign semiconductor sputtering target market.
From a domestic perspective, our products can fill the market gap for semiconductor materials, from a global perspective, we are able to closely follow the latest advanced semiconductor manufacturing technologies to meet the latest cabling technologies.
In technological innovation, ABLE TARGET closely following the developing trend of semiconductor manufacturing technology, make a continued development of high-end products.
For example,we mastered the technology of brazing and electron beam welding, diffusion welding technology, processing technology, packaging technology and analysis of cleaning and testing technology,this is the leading technique in China.
In addition, ABLE TARGET  also attached great importance to quality management, the pursuit of the quality meet or exceed the advanced level and be able to stay ahead in terms of cost control, and now our products are cheaper than the similar products in 10% lower -30%, and gain a competitive advantage.
For a new industry, our innovation is also reflected in the promotion of the development of the industry chain,through the establishment of sputtering target plant, we also help promote China’s sputtering target of raw materials industries. China is not the original raw material suppliers of sputtering target, and now the material is mainly imported from abroad. To promote the development of the industry chain, with the support of the related departments, we take the lead in planning the establishment of an industry alliance,which will play a positive role in domestic complete industrial chain,but also has played a key role for our future supply of raw materials for local lay foundation of the revitalization of China’s semiconductor industry .
In addition, we also try to extend thesputtering target for semiconductor technology to liquid crystal display and solar cells industry.
2008~2009, the international financial crisis, overall,for us,in this special period of the semiconductor industry, we has made some world-class business opportunities for our evaluation. During this period we focus on all the technical break, and the sample sent to the client certificate for future sales and development,and has laid a solid foundation. Since 2007, three years, we have made a growth rate of more than 90%.
The sputtering target industry in our country,led by us,has just begun to develope and will become a new bright spot in China’s semiconductor industry
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Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®