Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

Titanic Carbide

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Product name : Titanium Carbide target, Titanic Carbide sputtering target, TiC target, TiC sputtering target
Item : Titanium Carbide target, Titanic Carbide sputtering
Details :
Titanium Carbide target, Titanic Carbide sputtering target, TiC target, TiC sputtering target

Element: Titanium Carbide, Titanic Carbide

Name: Titanium Carbide target, Titanic Carbide sputtering target, TiC target, TiC sputtering target

Purity: 99.9 – 99.999%

Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.

To provide specifications of aluminum target supporter, mammography supporter, copper target supporter, Titanium target supporter.

Target metallization services

Target bonding services.  inquiry@abletarget.com

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Precious Alloys

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Precious Alloys target

ABLE TARGET Limited can produce many kind of precious metal/alloys sputtering targets such as

Gold Antimony, Au/Sb
Gold Arsenic, Au/As
Gold Boron, Au/B
Gold Copper, Au/Cu
Gold Germanium, Au/Ge
Gold Nickel, Au/Ni
Gold Nickel Indium, Au/Ni/In
Gold Palladium, Au/Pd
Gold Phosphorus, Au/P
Gold Silicon, Au/Si
Gold Silver Platinum, Au/Ag/Pt
Gold Tantalum, Au/Ta
Gold Tin, Au/Sn
Gold Zinc, Au/Zn
Palladium Lithium, Pd/Li
Palladium Manganese, Pd/Mn
Palladium Nickel, Pd/Ni
Platinum Palladium, Pt/Pd
Palladium Rhenium, Pd/Re
Platinum Rhodium, Pt/Rh
Silver Arsenic, Ag/As
Silver Copper, Ag/Cu
Silver Gallium, Ag/Ga
Silver Gold, Ag/Au
Silver Palladium, Ag/Pd
Silver Titanium, Ag/Ti

Au,Ag,Ir,Pt,Pd,Ru targets

precious metal target of Able Target Limited

Maybe what you need is not in the lists, we can also manufacture special size sputtering target according to our customer’s requests.

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ITO sputter target

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ITO sputtering target

 

99.9%~99.99%

chemical composition:

97 wt% In2O3,3 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥6.88g/cm3

95 wt% In2O3,5 wt%SnO2,purity:99.99% relative density:>99%, actual density: ≥7.05 g/cm3

90 wt% In2O3,10 wt%SnO2 purity:99.99% relative density:>99%, actual density: ≥7.06g/cm3

or in accordance with customer’s request;

membrane resistance: RF magnetic control, substrate heating temperature 220℃,

Shape: plate,tube.

Size: in accordance with customer’s request

We provide high-purity sputtering targets and vapor deposition materials in shapes and sizes to suit every application.

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AZO

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ZAO (ZnO:Al2O3)sputtering target

ZnO:Al2O3

AZO sputtering target for Coating engineers

AZO target:

main technical parameters:

*chemical composition: 98wt%ZnO, 2wt%Al2O3 (common) or in accordance with customer’s request;

*purity: 99.9,99.99;

*relative density: ≥99%; actual density: ≥5.60g/cm3

*sputtering target resistivity:2~8×10-4Ω•cm ;

*membrane resistance: RF magnetic control, substrate heating temperature 220℃
Shape: plate,tube

Maximum Size:

Planar: 300mm*600mm
Rotary target: diamiter 130~180Or in accordance with customer’s request

Application

Solar Cells Industry

Energy saving building glass Industry

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Welding methods between sputtering target and backing plate

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Welding methods between sputtering target and backing plate

Preparing tantalum target and backing plate,to add filler metal on the welding surface of backing plate;brazing in a vacuum environment, heating and the melting solder will be welded to backing plate and formating the target components; and make a insulation thermal diffusion treatment; cooling target components, and make mechanical processing to remove excess solder.
 
The invention is in the vacuum environment of the device,making a large area of welding, the welding metal surface can be effectively prevent oxidation,it is conducive to the infiltration of solder and metals, making the tantalum target and the binding strength between the back plate, resulting in sputtering process tantalum target to avoid the disengagement from the backing plate and get a normal sputtering.
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Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®