Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®

LCD sputtering targets

Able Target Provide sputtering targets in LCD applications.

In recent years the size of sputtering equipment has increased along with the increasing sizes of mother glass. Able Target provides high performance sputtering targets for these large sizes. In particular, ITO target, transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity.


Ti (TiO2),Al (Al2O3),SUS,Ta,Ag,ZnO,ITO,ZnO-Al2O3,

sputtering target application

Able Target Limited provide you sputtering targets in Semiconductor materials application :

Solar cell: Si, Ge, GaAs, GaSb, InGaP, CdTe, CdS, CIGS(CuInGaSe,CuInGaS), CIS (CuInSe), In2Se3, In2S3, GaS, CuS,Cu2S, CuSe, Cu2Se …

Thermoelectricity: Bi2Se3, Bi2Te3, Sb2Te3, Sb2Se3, HgTe, ZnSb, PbBi, PbTe, Bi(SiSb2), Bi(GeSe)3, CrSi2, MnSi1.73,FeSi2, CoSi, Ge0.3Si0.7, a-AlBi2, Bi1-xSbxTe1, Zn3Sb4 …

Infrared field: Si, Ge, CdS, PbS, PbSe, MgF2, InSb, InAs, GaAs,GaP, ZnSe, ZnS, Ge:Au,Ge:Hg,CaLaS4, InGaAs, Pb(1-x)SnxTe, Hg(1-x)CdxTe

Photoconductive detect field: CdS, CdSe, CdTe, PbS, Si, Ge, Insb, Hg0.75Cd0.25Te, Sb2S3, Ge:Au, Ge:Hg, HgCdTe, PbSnTe, Hg(1-x)CdxTe, PbxSn(1-x)Te, PbxSn(1-x)Se …

Able Target Limited-your best choice for sputtering target

Recently,Able Target Limited made some cooperations with some Universities and Research Institutes on the powder metallurgy and hot pressing technique.We gained many support and acceptances from professors and leaders of research centers.

Able Target Limited now has been the most excellent sputtering targets manufacturer and supplier of our country,and we have an absolute advantage for those target below and also including some other sputtering targets.

Rare earth oxide sputtering target,InGaZnO4 target,MoSi2 target,Ta2O5 target,NbO2 and Nb2O5 target,ZrO2 target,WO3 target, ZnO target, Hydroxyapatite ( HA : Ca10(PO4)6(OH)2 target. Al2O3,SiO2,TiOx,ZnO,ZAO(ZnO-Al2O3),Hf2O5,NiO,FexOy,SnO2,MgO,WO3,MoO3, Si3N4,TiN,BN,ZrN,TiB2 ZrB,LaB,WC,TiC,TaC

We are the only manufacturer which can produce Hydroxyapatite ( HA : Ca10(PO4)6(OH)2 target which has been put into application for  industrial customers.

We welcome all the partners come from companies, colleges, and researching centers to begin our mutual beneficial cooperation together.

Your support is our greatest power, we anticipated that altogether wins hand in hand with you, for this reason and unremitting efforts!


Vacuum Coating and sputtering targets

Vacuum coating

Vacuum coating science and technology is the most active one in the application of technology, which involves coating equipment, process, membrane, sputtering target and other aspects, many different types of films, where only one part of a simple exposition.

Hard film

Nature hardest diamond, cubic boron nitride second, third boron carbide.

① diamond films (CVD Production): hot filament CVD diamond film deposition rate method 2.5μm / h, HV40 ~ 50GPa;
② B4C Boron Carbide: Production by magnetron sputtering, high temperature thermal stability, 1100 ℃ or more, it is the most hard materials, HV50.4gPa;
③ composite film: TiN-Gen 1; TiCN, TiAlN – the second generation; third generation is a multi-component composite film and multilayer systems; TiN / TiCN, TiN / NbN, TiN / TiAlN, TiN / CrN, TaN / NbN (tantalum nitride / niobium nitride), HV55.6GPa, developed into a multi-layer nano-graded film – TiAl, TiAl1, TiAl2, ZrN (zirconium nitride). Direction of development: improving film toughness, wear resistance, heat resistance, corrosion resistance.

 Diamond coated tools

Research Interests: ① to improve diamond adhesion between the coating and the substrate, intermediate layer design, develop multi-coated tools; ② increase the deposition area and increase growth rate; ③ PVD method of diamond coating theory and technology.

Light, electricity, magnetic features film

The film features a wide range of different properties, to name just some examples.

① Thin Film: Y2O3: Eu (urea solution method D) Eu (RF sputtering);

② cold light film – highly reflective visible light, infrared light areas of high transmission, to achieve cold exposure, to protect the purpose of the illuminated objects;

③ organic optoelectronic films: metal phthalocyanine films: CuPc-PbPc; CuPc / ZnS; TiOPc highly sensitive coefficient;

④ optoelectronic functional composite film – Ag-Au-SiO2, Ag-BaO, Ag-SiO2, Ag-MgF2, in which nano-Ag-MgF2 cermet films have optical absorption properties, Ag-BaO with photoelectric emission;

⑤ transparent conductive film: ITO (In2O3: Sn), ZAO (ZnO: Al), IMO (In2O3: Mo);

⑥ photochromic film: 18 films alkyl substituted spiropyran (SP-18), change color under ultraviolet irradiation, colorless in the visible light of recovery can be used for optical information storage, optical switches, etc.;

⑦ magneto-optical recording films: PbFeCo (Pb, Fe, Co);

⑧ very large scale integration (VLSI): the Si substrate by sputtering Cu or Al, to achieve multi-layer wiring;

⑨ semiconductor films: SiC, ZnO;

⑩ other optical and electromagnetic properties of feature film:

LiF, CaF2 used in flat-type field emission display;
Fe / Cr multilayers with giant magnetoresistance (GMR);
Fe = SiO2 film with tunneling magnetoresistance (TMR);
TiO2 film has excellent dielectric, piezoelectric, gas and photocatalytic function;
Cu-SCN-Al (organic network and physical) are polar memory effect;
Triethylamine – four cyanide-P-quinone II methane (TEA (TCNQ) 2) is a single crystal can be used for high-density information storage of organic composite materials;
YBCO is a high-temperature superconducting (HTS) film.

Decorative film

Research Interests: ① positive for thin film materials composite, multi-type, high-performance, new technology direction ② the design of composite film, performance testing, methods of preparation; ③ of film stress (firmness); ④ of large area target production technology to improve target utilization.

Cutting-edge issues

① found to have the new features of the new coating material;

② remarkable features of the new design of the membrane system (membrane);

③ high-tech industries, such as integrated circuit industry, the information storage industry, flat panel display industry, including liquid crystal display (LCD), plasma display panel (PDP), field emission display (EL);

④ depth the relationship between the structure and properties of the film theory.

Sputtering Targets Manufacturer,Supplier™ Thin Film Coating | AbleTarget Limited®