AZO sputter target

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ZAO sputtering target,AZO sputter target,

AZO target: main technical parameters: *chemical composition: 98wt%ZnO, 2wt%Al2O3 (common) or in accordance with customer’s request;*purity: 99.9,99.99; *relative density: ≥99%; actual density: ≥5.60g/cm3*sputtering target resistivity:5×10—4Ω·cm ;*membrane resistance: RF magnetic control, substrate heating temperature 220℃,

Shape: plate,tube.

Size: in accordance with customer’s request

ZnOAl target,Zinc oxide-Al2O3 sputtering target