Metal Sputtering Targets

We have a wide range high purity metal sputtering targets like Aluminum, Titanium, Chromium,Cobalt, Copper, Gold, Silver, Hafnium,  Iridium, Molybdenum,with the purity of 99.9% to 99.9999%, which can be used for Semiconductor, Decorative, Glass coating and IC coatings.

Metal Sputtering Targets
Simbolo	Materialoj	Norma Pureco	Formo
Al	Aluminio	99.99%~99.9999%	Tajlorita
Sb	Antimony	99.99%	Tajlorita
Ba	Barium	99.9%	Tajlorita
Bi	Bismuth	99.99%	Tajlorita
B	Boron	99.9%	Tajlorita
Ca	Calcium	99.9%	Tajlorita
Cr	Kromo	99.5% ~ 99.98%	Tajlorita
Co	Cobalt	99.9% ~ 99.95%	Tajlorita
Cu	Kupro	99.9% ~ 99.999%	Tajlorita
Ir	Iridium	99.9%~99.95%	Tajlorita
Fe	Iron	99.9% ~ 99.99%	Tajlorita
Pb	Lead	99.9%~99.99%	Tajlorita
Mg	Magnesium	99.9% ~ 99.99%	Tajlorita
Mn	Manganese	99.5% ~ 99.9%	Tajlorita
Mo	Molibdeno	99.95%	Tajlorita
Ni	Nickel	99.9% ~ 99.999%	Tajlorita
Nb	Niobium	99.95%	Tajlorita
Pd	Palladium	99.95%	Tajlorita
Re	Rhenium	99.99%	Tajlorita
Rh	Rhodium	99.95%	Tajlorita
Ru	Rutenio	99.95%	Tajlorita
Se	Seleno	99.99% ~ 99.9999%	Tajlorita
n-Si	Silicon(N-type)	99.999%	Tajlorita
p-Si	Silicon(P-type)	99.999%	Tajlorita
Si	Silicon(undoped)	99.999%	Tajlorita
Ag	Arĝento	99.99%	Tajlorita
Sr	Strontium	99.9%	Tajlorita
Ta	Tantalum	99.95%,99.99%	Tajlorita
Sn	Stano	99.9% ~ 99.99%	Tajlorita
Ti	Titanio	99.6% ~ 99.995%	Tajlorita
Zn	Zinc	99.99%,99.999%	Tajlorita
Zr	Zirconium	99% ~ 99.95%	Tajlorita