Obiettivi sputtering rotanti  also called rotable sputtering targets, or Rotating Sputtering targets, or  tube sputtering targets, there are monolithic and bonding type and spray type.

Able Target is proud to announce its new range of Obiettivi sputtering rotanti.

The Rotary targets are produced by either spruzzatura al plasma  onto a base tube or from solid pieces, Lengths of over 2000 mm are manufactured.

We also have melting and casting, Vacuum Sintering, Vacuum Spraying,and HIP processing method for our Rotary targets,almost covers all the rotating sputtering targets production method.

A complemento del nostro avanzato spruzzo termico capacità, Able Target Limited ha sviluppato colata proprietaria capacità di produrre target di sputtering ruotabili selezionati per soddisfare le specifiche di alta densità e purezza.

We can also customize length, thickness, and target shape to meet application specific configuration.

Relative density: >99% Purity: >99.5%≥99.999%

Dimensioni del bersaglio per sputtering rotante: φ56~190mm L: 120~5000 mm

Plane sputtering target size: (30~4000)*(20~4000)*(4~25)mm

Our Rotable Sputtering Targets materials including :

ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,

NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.

Richiedi una brochure sui bersagli sputtering del Rotary  con i dettagli di produzione e confezionamento

At the meantime,we can produce customized size according to customer's requirement.