회전식 스퍼터링 타겟  also called rotable sputtering targets, or Rotating Sputtering targets, or  tube sputtering targets, there are monolithic and bonding type and spray type.

Able Target is proud to announce its new range of 회전식 스퍼터링 타겟.

The Rotary targets are produced by either 플라즈마 분사  onto a base tube or from solid pieces, Lengths of over 2000 mm are manufactured.

We also have melting and casting, Vacuum Sintering, Vacuum Spraying,and HIP processing method for our Rotary targets,almost covers all the rotating sputtering targets production method.

우리의 고급 보완 용사 기능, Able Target Limited가 개발했습니다. 독점 주조 고밀도 및 고순도 사양을 충족하기 위해 선별된 회전식 스퍼터링 타겟을 제조할 수 있는 능력.

We can also customize length, thickness, and target shape to meet application specific configuration.

Relative density: >99% Purity: >99.5%≥99.999%

회전식 스퍼터링 타겟 크기: φ56~190mm L: 120~5000mm

Plane sputtering target size: (30~4000)*(20~4000)*(4~25)mm

Our Rotable Sputtering Targets materials including :

ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,

NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.

로타리 스퍼터링 타겟 브로셔 요청  생산 및 포장 세부 사항 포함

At the meantime,we can produce customized size according to customer's requirement.