Metal Sputtering Targets We have a wide range high purity metal sputtering targets like Aluminum, Titanium, Chromium,Cobalt, Copper, Gold, Silver, Hafnium,  Iridium, Molybdenum,with the purity of 99.9% to 99.9999%, which can be used for Semiconductor, Decorative, Glass coating and IC coatings. Metal Sputtering Targets Symbol    Materials            Standard Purity          Shape Al Aluminum 99.99%~99.9999% Custom-made Sb Antimony 99.99% Custom-made Ba […]

Alloy Sputtering Targets Able Target provide various Alloy Sputtering targets according to different customized compositions. Advanced production With vacuum induction furnaces, vacuum melting furnaces, rolling mills, CNC machining centers, grinding machines, which can realize ingot smelting and subsequent processing from one kilogram to several hundred kilograms, realizing full control of production and better ensuring product quality. […]

Oxide Sputtering Targets Oxide sputtering targets are widely used for Flat panel, Solar cells, Semiconductor industries and researching purposes from universities. Oxide Sputtering Targets Symbol Materials Standard Purity Composition Shape Al2O3 Aluminum Oxide 99.99% Custom-made Custom-made Sb2O3 Antimony Oxide 99.99% Custom-made Custom-made ATO Antimony Doped Tin Oxide 99.9% ~ 99.99% Custom-made Custom-made BaO Barium Oxide […]

Rotary sputtering targets  also called rotable sputtering targets, or Rotating Sputtering targets, or  tube sputtering targets, there are monolithic and bonding type and spray type. Able Target is proud to announce its new range of Rotary sputtering targets. The Rotary targets are produced by either plasma spraying  onto a base tube or from solid pieces, Lengths of over […]