New sputtering targets

We have much advantages on processing some specific sputtering targets like

Ba2NaNbO15,AlSi,BaB2O4,BaFe12O19,BaTiO3,Bi2Sr2Ca2Cu3O,Bi12TiO2,CaWO4,

CdS,CdSe,SmCo,Se,SbTe,SbSe3,Sb2Se3,PbZrTiO3,NiO,NiMn,NiCo,NdFeB,MoSi,

MnFe3O4,MnFe2O4,MeFe12O15,MeFe2O3,Me2Fe2O5,LaSrMnO3,InSn,InSe,

InSb,In2Se3,HAP,GeTe,GdFe,GdCo,GaSb,GaN,FeNi,FeMnSi,FeCo,FeBSi,FeAl,

Fe2O3,CuZnAl,CuSe,CuInGaSe,CuInGa,CuIn,CoMn,CoFeBSi,CoFeB,CoFe2O4,

ZnSe,ZnO/Tm2O3,ZnO.MgO,ZnAl,WTi,TiO2,TiNi,TbFe,TbFe2,TbCo,Sr-xBa1-xNb2O4,

SrTiO3,SrRuO3 etc.

No Matter what you want,welcome to ask for a inquiry.