Roterende sputterdoelen  also called rotable sputtering targets, or Rotating Sputtering targets, or  tube sputtering targets, there are monolithic and bonding type and spray type.

Able Target is proud to announce its new range of Roterende sputterdoelen.

The Rotary targets are produced by either plasma spuiten  onto a base tube or from solid pieces, Lengths of over 2000 mm are manufactured.

We also have melting and casting, Vacuum Sintering, Vacuum Spraying,and HIP processing method for our Rotary targets,almost covers all the rotating sputtering targets production method.

Als aanvulling op onze geavanceerde thermische spray vermogen, Able Target Limited hebben ontwikkeld eigen gieterij mogelijkheid om geselecteerde roteerbare sputterdoelen te vervaardigen om te voldoen aan specificaties voor hoge dichtheid en hoge zuiverheid.

We can also customize length, thickness, and target shape to meet application specific configuration.

Relative density: >99% Purity: >99.5%≥99.999%

Roterende sputterdoelgrootte: φ56~190mm L: 120~5000 mm

Plane sputtering target size: (30~4000)*(20~4000)*(4~25)mm

Our Rotable Sputtering Targets materials including :

ZnO,i-ZnO, AZO, TiOx, TZO, ZnAl,CuGa, ZrO2,WOx,NbOx, Al2O3, Cu, Al, Sn, ZnSn, InSn, ATO, CdTe, V,

NiCr, NiV, CrAl,CrAlSi, AlTi,AlSn, Cr, AlTi, Ti, Zr, Hf,Mo, MoNb, Inconiel, W, Ta, Nb, SiAl, Si, etc.

Vraag naar een brochure over roterende sputterdoelen  met productie- en verpakkingsdetails

At the meantime,we can produce customized size according to customer's requirement.