Sputtering Target

Sputtering target

Able Target Limited is one of the earliest manufacturer engaged in Sputtering Target in china.

Compared to the evaporation coating method, Sputtering Target has quite obvious advantages in many aspects. As a relatively mature technology that has been developed, magnetron sputtering has been applied in many fields.

Magnetron sputtering targets classification:

Metal sputtering targets

Alloy sputter coating targets

Oxide ceramic targets

Boride ceramic sputtering targets

Carbide ceramic sputtering target

Nitride ceramic sputtering Targets

Selenide ceramic sputtering targets

Silicide ceramic sputtering targets

Sulfide ceramic sputtering targets

According to the shape, it can be divided into Square targets, Round targets, and Rotary Sputtering Target
According to the composition, it can be divided into metal target, alloy target, and ceramic compound sputtering targets.

According to different applications, it is divided into semiconductor-related ceramic targets, recording medium ceramic targets, display ceramic targets, superconducting ceramic targets, giant magnetoresistance ceramic targets, etc.

Sputtering is one of the main techniques for preparing thin film materials. It uses ions generated by an ion source to accelerate and aggregate in a vacuum to form a high-speed energy ion beam, bombarding a solid surface, and kinetic energy exchange between ions and solid surface atoms.

The atoms on the solid surface are separated from the solid and deposited on the surface of the substrate.

The bombarded solid is a raw material for preparing a deposited film by sputtering, which is called a sputtering target. Various types of sputtered thin film materials have been widely used in semiconductor integrated circuits, solar photovoltaics, recording media, flat displays, and surface coatings of workpieces.

Maybe what you need is not in the lists,but we can also manufacture special size Sputtering Targets according to our customer’s requests.