sputtering deposition

What is sputtering deposition ?

Sputtering deposition is to use a plasma, which is usually formed from a non-reactive gas, and to bombard the target material for the thin film and knock the atoms of the target material out of its bulk.

 The ejected atoms then land on the substrate and form a thin film. Since the target does not need to be heated, the technique is very flexible for a wide range of applications.

 The sputtering targets can even be made of compounds or mixtures, not just pure elements.

Able Target Ltd can provide you all kinds of sputtering targets which are used in industry application and scientific researching experiments.

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