NiCr Sputtering target

Purity 99.9%~99.95%

Grain size: <100micron

Our nickel-chromium alloy Sputtering target production technology has been significantly improved.

The grain size of NiCr alloy target is uniform, without defects, and the production volume is sufficient.

Whether it is a planar shape nickel-chromium target or a rotating/rotary nickel-chromium target, the length can be supplied to 4 meters, which is widely used in coated glass factories all over the world.