NiCr Sputtering target Purity 99.9%~99.95% Grain size: <100micron Our nickel-chromium alloy Sputtering target production technology has been significantly improved. The grain size of NiCr alloy target is uniform, without defects,…
NiCr Sputtering target Purity 99.9%~99.95% Grain size: <100micron Our nickel-chromium alloy Sputtering target production technology has been significantly improved. The grain size of NiCr alloy target is uniform, without defects,…